|Title||Photopatterning of Indomethacin Thin Films: a Solvent-Free Vapor-Deposited Photoresist|
|Publication Type||Journal Article|
|Year of Publication||2015|
|Authors||Camera, Katherine L., Jaritza Gómez-Zayas, Daisuke Yokoyama, M. D. Ediger, and Christopher K. Ober|
|Journal||ACS Applied Materials and Interfaces|
We report indomethacin as a photoresist that can be dry-deposited (as well as spin-coated), and developed in weak aqueous base. This is the first reported patterning of indomethacin as a resist material. Nanometer-scale patterns were achieved through DUV photolithography and the underlying patterning mechanism was investigated.