Photopatterning of Indomethacin Thin Films: a Solvent-Free Vapor-Deposited Photoresist

TitlePhotopatterning of Indomethacin Thin Films: a Solvent-Free Vapor-Deposited Photoresist
Publication TypeJournal Article
Year of Publication2015
AuthorsCamera, Katherine L., Jaritza Gómez-Zayas, Daisuke Yokoyama, M. D. Ediger, and Christopher K. Ober
JournalACS Applied Materials and Interfaces
Volume7
Issue42
Start Page23398
Pagination3
Date Published09/2015
Abstract

We report indomethacin as a photoresist that can be dry-deposited (as well as spin-coated), and developed in weak aqueous base. This is the first reported patterning of indomethacin as a resist material. Nanometer-scale patterns were achieved through DUV photolithography and the underlying patterning mechanism was investigated.

DOI10.1021/acsami.5b05361